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Fabrication of high aspect ratio SU-8 micropillar arrays

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Author

  • Letizia Amato
  • Stephan S. Keller
  • Arto Heiskanen
  • Maria Dimaki
  • Jenny Emnéus
  • Anja Boisen
  • Maria Tenje

Summary, in English

SU-8 is the preferred photoresist for development and fabrication of high aspect ratio (HAR) three dimensional patterns. However, processing of SU-8 is a challenging task, especially when the film thickness as well as the aspect ratio is increasing and the size of the features is close to the resolution limit of photolithography. This paper describes process optimization for the fabrication of dense SU-8 micropillar arrays (2.5 μm spacing) with nominal height ⩾20 μm and nominal diameter ⩽2.5 μm (AR ⩾8). Two approaches, differing in temperature, ramping rate and duration of the baking steps were compared as part of the photolithographic processing, in order to evaluate the effect of baking on the pattern resolution. Additionally, during the post-processing, supercritical point drying and hard baking were introduced yielding pillars with diameter 1.8 μm, AR = 11 and an improved temporal stability.

Publishing year

2012

Language

English

Pages

483-487

Publication/Series

Microelectronic Engineering

Volume

98

Issue

Special issue MNE 2011 - Part II

Document type

Journal article

Publisher

Elsevier

Topic

  • Analytical Chemistry
  • Medical Engineering

Keywords

  • High-aspect ratio SU-8
  • Micropillars
  • UV photolithography

Status

Published

ISBN/ISSN/Other

  • ISSN: 1873-5568