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Reduction of native oxides on InAs by atomic layer deposited Al2O3 and HfO2

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Author

Publishing year

2010

Language

English

Publication/Series

Applied Physics Letters

Volume

97

Document type

Journal article (letter)

Publisher

American Institute of Physics (AIP)

Topic

  • Atom and Molecular Physics and Optics

Status

Published

Research group

  • Nano

ISBN/ISSN/Other

  • ISSN: 0003-6951