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Surface degradation of InxGa1-xN thin films by sputter-anneal processing: A scanning photoemission microscope study

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Author

  • JE Downes
  • KE Smith
  • AY Matsuura
  • Ingolf Lindau
  • E Iliopoulos
  • TD Moustakas

Summary, in English

The effects of nitrogen ion sputtering and thermal anneal processing on the surface electronic structure of the ternary III-V semiconductor In0.12Ga0.88N have been studied using scanning photoemission microscopy. No phase separation of the material is observed for annealing temperatures up to 650degreesC. However, samples annealed at 700degreesC for 5 h show clear evidence of phase separation. Furthermore, annealing at these temperatures with the sample surface directly exposed to ultrahigh vacuum produces a surface greatly deficient in In and with considerable surface roughness. This can be circumvented by using a sacrificial sample in physical contact with the film to artificially increase the local vapor pressure of Ga, In, and N during annealing. (C) 2003 American Institute of Physics.

Publishing year

2003

Language

English

Pages

5820-5825

Publication/Series

Applied Physics Reviews

Volume

94

Issue

9

Document type

Journal article

Publisher

American Institute of Physics (AIP)

Topic

  • Atom and Molecular Physics and Optics

Status

Published

ISBN/ISSN/Other

  • ISSN: 1931-9401