Investigation of polymethylmethacrylate resist residues using photoelectron microscopy
Author
Summary, in English
Publishing year
2002
Language
English
Pages
1139-1142
Publication/Series
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Volume
20
Issue
3
Document type
Conference paper
Publisher
American Institute of Physics (AIP)
Topic
- Physical Sciences
- Natural Sciences
- Condensed Matter Physics
- Atom and Molecular Physics and Optics
Conference name
20th North American Conference on Molecular Beam Epitaxy
Conference date
2001-10-01 - 2001-10-03
Status
Published
ISBN/ISSN/Other
- ISSN: 1071-1023
- ISSN: 1520-8567