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Study of thin oxide films by electron, ion and synchrotron radiation beams

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Author

  • V Sammelselg
  • E Rauhala
  • K Arstila
  • Alexei Zakharov
  • J Aarik
  • A Kikas
  • J Karlis
  • A Tarre
  • A Seppala
  • J Asari
  • Indrek Martinson
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Summary, in English

Titanium oxide and zirconium oxide thin films deposited on silicon substrates were characterised using electron probe microanalysis (EPMA), Rutherford backscattering spectroscopy (RBS), time-of-flight elastic recoil detection analysis (TOF-ERDA) and scanning photoelectron microscopy (SPEM). The composition and mass thickness of the films were determined and the results of different methods compared. It was revealed that the synchrotron radiation used for SPEM studies caused considerable modification of zirconia films grown at low temperatures.

Publishing year

2002

Language

English

Pages

165-169

Publication/Series

Mikrochimica Acta

Volume

139

Issue

1-4

Document type

Journal article

Publisher

Springer

Topic

  • Physical Sciences

Keywords

  • oxide films
  • TOF-ERDA
  • RBS
  • scanning photoelectron microscopy
  • EPMA

Status

Published

ISBN/ISSN/Other

  • ISSN: 1436-5073