SiGe Esaki tunnel diodes fabricated by UHV-CVD growth and proximity rapid thermal diffusion
Author
Summary, in English
A process for realisation of SiGe Esaki diodes in layers grown by ultra-high vacuum chemical vapour deposition has been developed and the first Esaki diodes are reported for this growth method. Intrinsic SiGe-layers are grown on highly boron-doped p(+)-Si layers, while post-growth proximity rapid thermal diffusion of phosphorous into the SiGe is employed to form an n(+)-layer. Tunnel diodes with a depletion layer width of about 6 nm have been realised in Si0.74Ge0.26, showing a peak current density of 0.18 kA/cm(2) and a current peak-to-valley ratio of 2.6 at room temperature.
Publishing year
2004
Language
English
Pages
83-85
Publication/Series
Electronics Letters
Volume
40
Issue
1
Document type
Journal article
Publisher
IEE
Topic
- Electrical Engineering, Electronic Engineering, Information Engineering
- Condensed Matter Physics
Status
Published
ISBN/ISSN/Other
- ISSN: 1350-911X