The browser you are using is not supported by this website. All versions of Internet Explorer are no longer supported, either by us or Microsoft (read more here: https://www.microsoft.com/en-us/microsoft-365/windows/end-of-ie-support).

Please use a modern browser to fully experience our website, such as the newest versions of Edge, Chrome, Firefox or Safari etc.

InAsP/InAs nanowire heterostructure field effect transistors

Author

Summary, in English

We here show simulation results that by including a small InAsP heterostructure barrier inside the channel of a InAs nanowire transistor it is possible to increase both the sub threshold slope and on-off ratio with only a modest decrease in the drive current for a fixed gate overdrive. The design is based on the fact that the sharp InAsP heterostructure induces a small barrier in the conduction band and locally increases the bandgap, independent of the applied drain voltage

Publishing year

2006

Language

English

Pages

173-174

Publication/Series

Device Research Conference

Document type

Conference paper

Publisher

IEEE - Institute of Electrical and Electronics Engineers Inc.

Topic

  • Condensed Matter Physics
  • Electrical Engineering, Electronic Engineering, Information Engineering

Keywords

  • nanowire heterostructure field effect transistors
  • InAsP-InAs

Conference name

Device Research Conference, 2006

Conference date

2006-06-26 - 2006-06-28

Conference place

University Park, PA, United States

Status

Published

ISBN/ISSN/Other

  • ISBN: 0-7803-9748-7