The browser you are using is not supported by this website. All versions of Internet Explorer are no longer supported, either by us or Microsoft (read more here: https://www.microsoft.com/en-us/microsoft-365/windows/end-of-ie-support).

Please use a modern browser to fully experience our website, such as the newest versions of Edge, Chrome, Firefox or Safari etc.

Oxygen-etching of h-BN/Ru(0001) nanomesh on the nano- and mesoscopic scale

På svenska

Author

Summary, in English

The stability of the recently discovered b-BN/Ru(0001) nanomesh is of crucial importance for potential applications as a nanotemplate. In particular, thermal stability in oxygen environment is important for nanocatalysis applications. We report here on the etching experiments of the h-BN layer by molecular oxygen exposure at elevated temperatures. This process is studied both by scanning tunneling microscopy (STM) on a microscopic scale and with in situ low energy electron microscopy (LEEM) on the mesoscopic scale. Temperature thresholds are determined for the microscopic (600 degrees C) and the mesoscopic (750 degrees C) etching processes for O-2 pressures up to 1 x 10(-6) mbar. Submonolayer amounts of An deposited on the h-BN/Ru(0001) nanomesh improve considerably the stability of the h-BN nanomesh against etching by O-2.

Department/s

Publishing year

2008

Language

English

Pages

10423-10427

Publication/Series

Journal of Physical Chemistry C

Volume

112

Issue

28

Document type

Journal article

Publisher

The American Chemical Society (ACS)

Topic

  • Physical Sciences
  • Natural Sciences

Status

Published

ISBN/ISSN/Other

  • ISSN: 1932-7447