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Reactive dc magnetron sputter deposited Al2O3: large area coatings for industrial application

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Author

  • Maryam Olsson
  • Karol Macak
  • Wolfgang Graf

Summary, in English

Stoichiometric Al2O3 films are produced with a pure Al source in the metallic state in an O2+Ar gas mixture using reactive d.c. magnetron sputtering. Substrates as large as 70×100 cm2 are uniformly coated at room temperature while moving in front of the cathode. The key to the success lies in utilizing a sufficiently high working gas pressure and a sufficiently large source-to-substrate distance. Monte Carlo simulations are used to estimate the latter. The process is extremely stable, and despite the large target size, no arcing is detected.

Publishing year

1999

Language

English

Pages

202-207

Publication/Series

Surface & Coatings Technology

Volume

122

Issue

2-3

Document type

Journal article

Publisher

Elsevier

Topic

  • Social Sciences Interdisciplinary
  • Other Engineering and Technologies not elsewhere specified

Keywords

  • Al2O3
  • Large area coatings
  • Reactive d.c. magnetron sputtering

Status

Published

ISBN/ISSN/Other

  • ISSN: 0257-8972