High rate direct current reactive sputter deposition of Al2O3 - Required process parameters
Author
Publishing year
1997
Language
English
Pages
176-176
Publication/Series
CIP'97 proceedings : 11th International colloquium on plasma processes, May 25-29, 1997
Document type
Conference paper
Publisher
Société française du vide
Topic
- Social Sciences Interdisciplinary
- Other Engineering and Technologies not elsewhere specified
Conference name
11th International colloquium on plasma processes
Conference date
1997-05-25 - 1997-05-29
Conference place
Le Mans, France
Status
Published