The browser you are using is not supported by this website. All versions of Internet Explorer are no longer supported, either by us or Microsoft (read more here: https://www.microsoft.com/en-us/microsoft-365/windows/end-of-ie-support).

Please use a modern browser to fully experience our website, such as the newest versions of Edge, Chrome, Firefox or Safari etc.

Growth and oxidization stability of cubic Zr1-xGdxN solid solution thin films

På svenska

Author

  • Carina Höglund
  • B. Alling
  • J. Jensen
  • L. Hultman
  • J. Birch
  • Richard Hall-Wilton

Summary, in English

We report Zr1-xGdxN thin films deposited by magnetron sputter deposition. We show a solid solubility of the highly neutron absorbing GdN into ZrN along the whole compositional range, which is in excellent agreement with our recent predictions by first-principles calculations. An oxidization study in air shows that Zr1-xGdxN with x reaching from 1 to close to 0 fully oxidizes, but that the oxidization is slowed down by an increased amount of ZrN or stopped by applying a capping layer of ZrN. The crystalline quality of Zr0.5Gd0.5N films increases with substrate temperatures increasing from 100 degrees C to 900 degrees C. (C) 2015 Author(s).

Publishing year

2015

Language

English

Publication/Series

Applied Physics Reviews

Volume

117

Issue

19

Document type

Journal article

Publisher

American Institute of Physics (AIP)

Topic

  • Materials Chemistry

Status

Published

ISBN/ISSN/Other

  • ISSN: 1931-9401