RF and DC Analysis of Stressed InGaAs MOSFETs
Author
Summary, in English
A complete reliability study of the DC and RF characteristics for InGaAs nMOSFETs with aluminium oxide/ hafnium oxide dielectric is presented. The main stress variation at high frequencies is related to a threshold voltage shift, whereas no decrease is found in the maximum of the cut-off frequency and RF-transconductance. Constant gate stress leads to a charge build up causing a threshold voltage shift. Furthermore, electron trapping at the drain side degrades the performance after hot carrier stress. The maximum DC-transconductance is reduced following constant gate bias stress, by an increase in charge trapping at border defects. These border defects at the channel/high-k interface are filled by cold carrier trapping when the transistor is turned on, whereas they do not respond at high frequencies.
Publishing year
2014
Language
English
Pages
181-183
Publication/Series
IEEE Electron Device Letters
Volume
35
Issue
2
Full text
- Available as PDF - 324 kB
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Document type
Journal article
Publisher
IEEE - Institute of Electrical and Electronics Engineers Inc., IEEE - Institute of Electrical and Electronics Engineers Inc.
Topic
- Electrical Engineering, Electronic Engineering, Information Engineering
Keywords
- high-k
- InGaAs
- MOSFET
- reliablity
- RF
Status
Published
ISBN/ISSN/Other
- ISSN: 0741-3106