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Site-controlled Ge quantum dot growth on Si by the use of electron beam pre-patterning

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Author

Summary, in English

By growth of Si on substrates that have been pre-patterned by electron-beam induced carbon nano-growth masks, nano-holes form at the Si surface. We have grown self-assembled Ge quantum dots in these holes by ultra high vacuum chemical vapour phase deposition (UHV-CVD). We usually find four dots in each hole. By varying the amount of deposited Ge, we can obtain either four dome-shaped or four pyramid-shaped dots in the majority of holes. These dot arrangements could be used for the realisation of the simplest functional cell for quantum-dot cellular automata (QCA)

Publishing year

2002

Language

English

Publication/Series

7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science

Document type

Conference paper

Publisher

Lund University

Topic

  • Condensed Matter Physics

Keywords

  • site controlled Ge quantum dot growth
  • Si substrate
  • Si
  • electron beam prepatterning
  • self assembly
  • ultra high vacuum chemical vapour phase deposition
  • carbon nanogrowth masks
  • four pyramid shaped dots
  • dome shaped dots
  • simplest functional cell
  • Ge
  • quantum dot cellular automata

Conference name

Proceedings of 7th International Conference on Nanometer-Scale Science and Technology and 21st European Conference on Surface Science (NANO-7/ECOSS-21)

Conference date

2002-06-24 - 2002-06-28

Conference place

Malmö, Sweden

Status

Published