The browser you are using is not supported by this website. All versions of Internet Explorer are no longer supported, either by us or Microsoft (read more here: https://www.microsoft.com/en-us/microsoft-365/windows/end-of-ie-support).

Please use a modern browser to fully experience our website, such as the newest versions of Edge, Chrome, Firefox or Safari etc.

High-rate reactive magnetron sputter deposition and characterization of metal oxide films

Author

  • Maryam Olsson

Summary, in English

to be added

Publishing year

2000

Language

English

Document type

Dissertation

Publisher

Uppsala University

Topic

  • Other Engineering and Technologies not elsewhere specified
  • Social Sciences Interdisciplinary

Status

Published

Supervisor

  • Claes Göran Granqvist

ISBN/ISSN/Other

  • ISBN: 91-554-4683-3

Defence date

5 April 2000

Defence time

00:09

Defence place

Uppsala University, Ångström laboratory

Opponent

  • William Westwood (Consultant)