Electron-Beam Patterning of Polymer Electrolyte Films To Make Multiple Nanoscale Gates for Nanowire Transistors

Summary, in English

We report an electron-beam based method for the nanoscale patterning of the poly(ethylene oxide)/LiClO4 polymer electrolyte. We use the patterned polymer electrolyte as a high capacitance gate dielectric in single nanowire transistors and obtain subthreshold swings comparable to conventional metal/oxide wrap-gated nanowire transistors. Patterning eliminates gate/contact overlap, which reduces parasitic effects and enables multiple, independently controllable gates. The method's simplicity broadens the scope for using polymer electrolyte gating in studies of nanowires and other nanoscale devices.

• Author: Damon J. Carrad; Adam M. Burke; Roman W. Lyttleton; Hannah J. Joyce; Hark Hoe Tan; Chennupati Jagadish; Kristian Storm; Heiner Linke; Lars Samuelson; Adam P. Micolich
• Department/s: Solid State Physics
• Publishing year: 2014
• Language: English
• Pages: 94-100
• Publication/Series: Nano Letters
• Volume: 14
• Issue: 1
• Links: http://dx.doi.org/10.1021/nl403299u
• Document type: Journal article
• Publisher: The American Chemical Society (ACS)
• Topic: Nano Technology
• Keywords: III-V nanowires; polymer electrolytes; electron beam lithography; nanoelectronics
• Status: Published
• Research group: Nanometer structure consortium (nmC)
• ISBN/ISSN/Other: ISSN: 1530-6992